Introduction of a new High Density Plasma reactor concept for high aspect ratio oxide etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1803, Issue , 1993, Pages 235-247

  Marks, J ^a   Collins, K ^a   Yang, C L ^a   Groechel, D ^a   Keswick, P ^a   Cunningham, C ^a   Carlson, M ^b  

^a APPLIED MATERIALS INC   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTROMAGNETIC INDUCTION; ETCHING; PLASMA APPLICATIONS; STICTION; SUPPORTS;

DEVICE DEGRADATION; DEVICE TECHNOLOGIES; HIGH ASPECT RATIO; HIGH ASPECT RATIO STRUCTURES; HIGH DENSITY PLASMAS; HIGH SELECTIVITY; INDUCTIVELY-COUPLED; SUBSTRATE MATERIAL;

ASPECT RATIO;

EID: 84939719458     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.142920     Document Type: Conference Paper

References (8)

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2. 2 Etching with High Performance ECR Plasma", 1991 Dry Process Symposium, II-3, pp. 47-52, 1991
3. David C. Gray and Herbert H. Sawin, "Quantification of Plasma-Surface Interactions in Fluorocarbon Plasma Etching of Silicon and Silicon Dioxide", 1991 Dry Process Symposium, I-1, pp. 1-7, 1991
4. J. R. Engstrom, M. M. Nelson, D. J. Bonser and T. Engel, "Molecular Beam Studies of the Reaction of Fluorine and Oxygen with Silicon Surfaces", 1991 Dry Process Symposium, I-2, pp. 9-16, 1991
5. M. Kobayashi and M. Nakamura, "Pulsed Laser Radiated RIE-Control of CFx Polymer Film-", 1991 Dry Process Symposium, III-4, pp. 87-91, 1991
6. Shin Arai, Kazunori Tsujimoto and Shin'ichi Tachi, "Deposition in Dry Etching Gas Plasmas", 1991 Dry Process Symposium, III-1, pp. 69-74, 1991
7. Naokatsu Ikegami, Nobuo Ozawa, Yasuhio Miyakawa, Norio Hirashita and Jun. Kanamori, "Mechanisms of Surface Reactions in Dry Etching of Silicon Oxide", 1991 Dry Process Symposium, I-5, pp. 29-32, 1991
8. Gerald Z. Yin, Monique Ben-Dor, Mark S. Chang, D. Rafinejad, "Etching Silicon Dioxide with High Selectivity and Low Polymer Formation", Semiconductor International. September 1988, 11/88