Polysilicon as a material for microsensor applications

Sensors and Actuators: A. Physical

Volumn 30, Issue 1-2, 1992, Pages 149-155

  Obermeier, E ^a   Kopystynski, P ^a  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); PIEZOELECTRIC TRANSDUCERS; PRESSURE TRANSDUCERS; RESISTORS; SEMICONDUCTING SILICON; TEMPERATURE MEASURING INSTRUMENTS;

POLYSILICON; PRESSURE SENSORS; TEMPERATURE COEFFICIENT;

SILICON SENSORS;

EID: 0026476186     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(92)80210-T     Document Type: Article

References (16)

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