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Volumn 32, Issue 3, 1985, Pages 658-661
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The Hooge Parameters of n+-p-n and p+-n-p Silicon Bipolar Transistors
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRONS - DIFFUSION;
SEMICONDUCTING SILICON - APPLICATIONS;
EMITTER-BASE SPACE-CHARGE REGION;
HOOGE PARAMETERS;
MOBILITY AND DIFFUSION FLUCTUATIONS;
SILICON BIPOLAR TRANSISTORS;
SURFACE RECOMBINATION;
TRANSISTORS, BIPOLAR;
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EID: 0022024794
PISSN: 00189383
EISSN: 15579646
Source Type: Journal
DOI: 10.1109/T-ED.1985.21994 Document Type: Article |
Times cited : (28)
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References (11)
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