Charge and Interface State Generation in Field Oxides

IEEE Transactions on Nuclear Science

Volumn 31, Issue 6, 1984, Pages 1273-1279

  Boesch, H Edwin ^a   Taylor, Thomas L ^a  

^a U S ARMY RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; SEMICONDUCTOR DEVICES, MOS - RADIATION EFFECTS;

CHARGE GENERATION; FIELD OXIDES; INTERFACE STATE GENERATION;

CAPACITORS;

EID: 0021617164     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1984.4333495     Document Type: Article

References (15)

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