Photoelectron diffraction intensity calculation by using tensor low-energy electron diffraction theory

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1621-1625

  Omori, Shinji ^a   Nihei, Yoshimasa ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013140632     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581861     Document Type: Article

References (18)

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15. L0Lc.
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