High energy xenon ion beam assisted deposition of TiN film and its industrial application

Journal of Materials Science

Volumn 31, Issue 2, 1996, Pages 363-369

  Wang, Xi ^a   Yang, Genqing ^a   Liu, Xianghuai ^a   Zheng, Zhihong ^a   Huang, Wei ^a   Zou, Shichang ^a   Martin, P J ^b   Bendavid, A ^b   Han, J G ^c   Yoon, J S ^c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CSIRO   (Australia)

^c Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATINGS; COMPOSITION; DEPOSITION; ION BEAMS; MECHANICAL PROPERTIES; MORPHOLOGY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACES; SYNTHESIS (CHEMICAL); THIN FILMS; XENON;

ION BEAM ASSISTED DEPOSITION; PHYSICAL VAPOR DEPOSITION;

TITANIUM NITRIDE;

EID: 0029774925     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01139153     Document Type: Article

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