Preparation and properties of Bi4-xlaxTi 3O12 ferroelectric thin films using excimer UV irradiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 11 B, 2002, Pages 6814-6819

  Hayashi, Takashi ^a   Togawa, Daichi ^a   Yamada, Mio ^b   Sakamoto, Wataru ^b   Hirano, Shin Ichi ^b  

^a SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Bi4 xLaxTi3O12 thin film; Chemical solution deposition; Excimer UV irradiation; Ferroelectric properties; Low temperature crystallization

Indexed keywords

CRYSTALLIZATION; FERROELECTRIC DEVICES; THERMAL EFFECTS; ULTRAVIOLET RADIATION;

CHEMICAL SOLUTION DEPOSITION; EXCIMER UV IRRADIATION; FERROELECTRIC PROPERTIES; LOW-TEMPERATURE CRYSTALLIZATION;

THIN FILMS;

EID: 0012736027     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.41.6814     Document Type: Article

References (9)

1. B- H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee and W. Jo: Nature 401 (1999) 682.
2. Y. Noguchi, I. Miwa, Y. Goshima and M. Miyayama: Jpn. J. Appl. Phys. 39 (2000) L1259.
3. Y. Noguchi and M. Miyayama: Appl. Phys. Lett. 78 (2001) 1903.
4. H. Uchida, H. Yoshikawa, I. Okada, H. Matsuda, T. lijima, T. Watanabe and H. Funakubo: Mater. Res. Soc. Symp. Proc. 688 (2002) CC2.3.1.
5. E.Tokumitsu, T. Isobe, T. Kijima and H. Ishiwara: Mater. Res. Soc. Symp.Proc. 655 (2001) CC13.9.1.
6. K. Nishizawa, T. Miki, K. Suzuki and K. Kato: Abstr. 1st Asian Meet. Electroceramic and The 20th Electronics Division Meet. (2000) p. 48.
7. T. Tsuchiya, A. Watanabe, Y. Imai, H. Niino, I. Yamaguchi, T. Manabe, T. Kumagai and S. Mizuta: Jpn. J. Appl. Phys. 39 (2000) L866.
8. T. Hayashi and D. Togawa: Jpn. I. Appl. Phys. 40 (2001) 5585.
9. M. R. Hunt and G. Winter: Inorg. Nucl. Chem. Lett. 6 (1970) 529.