Iodine and carbon tetrabromide use in solid source molecular beam epitaxy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1361-1366

  Miller, D L ^a   Micovic, M ^a   Lubyshev, D I ^a   Cai, Weizhong ^a   Hwang, Wen Yen ^a,b   Zhang, Kai ^a,c  

^a The Pennsylvania State University   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c EG&G   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012672139     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590076     Document Type: Article

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