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Chemical Vapor Deposition

Volumn 8, Issue 6, 2002, Pages 262-265

Growth characteristics and texture of cubic boron nitride films produced by CVD

(4) Jiang, Xin a Helming, Kurt b Zhang, Wenjun c Matsumoto, Seiichiro c

a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST (Germany)

b CLAUSTHAL UNIVERSITY OF TECHNOLOGY (Germany)

c NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CUBIC BORON NITRIDE; FILM GROWTH; TEXTURES; X RAY ANALYSIS;

CRYSTAL QUALITY; FILM SURFACES; PHONON MODES; X RAY TEXTURE ANALYSIS;

THIN FILMS;

EID: 0012543429 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3862(20021203)8:6<262::AID-CVDE262>3.0.CO;2-W Document Type: Article

Times cited : (9)

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