Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 228-235

  Guerrero, Douglas J ^a   Meador, James D ^a   Xu, Gu ^a   Suzuki, Hitoshi ^b   Sone, Yasuhisa ^b   Krishnamurthy, Vandana N ^a   Claypool, James B ^a   Lamb III, James E ^a  

^a BREWER SCIENCE INC   (United States)

^b Nissan Central Research Institute   (Japan)

Author keywords

Antireflective coating; BARC; Compatible; Conformality; Fast etch; Optical density

Indexed keywords

DENSITY (OPTICAL); DENSITY MEASUREMENT (OPTICAL); MICROMETERS; PHOTORESISTORS; SPIN DYNAMICS; SURFACE TREATMENT; THICKNESS MEASUREMENT;

ANTIREFLECTIVE COATING; BARC; COMPATIBLE; CONFORMALITY; FAST ETCH; OPTICAL DENSITY;

COATINGS;

EID: 0012051402     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312412     Document Type: Conference Paper

References (7)

1. J. Sturtevant, "Zero Tolerance for Reflected Light", Future Fab International, vol. 1(3), p. 153-154, 1997.
2. J. E. Lamb III, "Organic ARC Anti-Reflective Coating Applications within the Microelectronic Industry", Semiconductor Fabtech, vol. 2, p. 223-227, 1995.
3. R. DeJule, "Resist Enhancement with Antireflective Coatings", Semiconductor International, p. 169-175, July 1996.
4. E. K. Paveichek and J. E. Lamb III, "Improvements in Organic BARCs", Future Fab International, vol. 1(3), p. 154-155, 1997.
5. The new BARC is sold by Brewer Science under the trademark DUV42.
6. The photoresist products mentioned in this paper are trademarks of their respective companies.
7. AR2 is a trademark of Shipley Company.