Aggregation and out diffusion of iron atoms for Fe ion implanted silica films

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2550-2554

  Ding, Xing Zhao ^a,b   Chiah, M F ^a   Cheung, W Y ^a   Wong, S P ^a   Xu, J B ^a   Wilson, I H ^a   Wang, Hui Min ^b   Chen, Li Zhi ^b   Liu, Xiang Huai ^b  

^a CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011997045     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371091     Document Type: Article

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