Ion sources for industrial applications (invited)

Review of Scientific Instruments

Volumn 69, Issue 2, 1998, Pages 863-867

  Ishikawa, Junzo ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011946645     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1148610     Document Type: Conference Paper

References (12)

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3. T. S. Green, IEEE Trans. Nucl. Sci. IETNAE NS-23, 918 (1976).
4. Y. Matsuda, H. Inami, T. Yamashita, S. Fujiwara, Y. Inouchi, K. Matsunaga, and K. Matsuda, Rev. Sci. Instrum. RSINAK 63, 2481 (1992).
5. M. Yamashita, Jpn. J. Appl. Phys. Part I JAPNDE 26, 721 (1987).
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7. H. Tsuji, J. Ishikawa, T. Tomita, and Y. Gotoh, IEEE Proceedings of the 11th Int’l Conference on Ion Implantation Technology, Austin, Vol. 1, Issue 1, 16–21 June 1996 (IEEE Service Center, Piscataway, 1997), 334.
8. J. Ishikawa, Application of Accelerators in Research and Industry, edited by J. L. Duggan and, I. L. Morgan, AIP Conf. Proc. No. APCPCS392 (AIP, New York 1997), p. 915.
9. Y. Toyota, H. Tsuji, Y. Gotoh, and J. Ishikawa, Jpn. J. Appl. Phys. Part I JAPNDE 34, 6487 (1995).
10. J. Ishikawa, H, Tsuji, and Y. Gotoh, IEEE Proceedings of the 11th Int’l. Conference on Ion Implantation Technology, Austin, Vol. 1, Issue 1, 16–21 June 1996 (IEEE Service Center, Piscataway, 1997), 249.
11. J. Ishikawa, H. Tsuji, M. Mimura, and Y. Gotoh, IEEE Proceedings of the 11th Int’l Conference on Ion Implantation Technology, Austin, Vol. 1, Issue 1, 16–21 June 1996 (IEEE Service Center, Piscataway, 1997), 776.
12. D. Takeuchi, N. Shimada, J. Matsuo, and I. Yamada, IEEE Proceedings of the 11th Int’l Conference on Ion Implantation Technology, Austin, Vol. 1, Issue 1, 16–21 June 1996 (IEEE Service Center, Piscataway, 1997), 772.