CD control of ASIC polysilicon gate level

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 607-619

  Tyminski, Jacek K ^a   McNamara, Sean J ^a   Meisner, Stephen A ^b   Gorham, Ronald R ^b  

^a NIKON PRECISION INC   (United States)

^b Cirent Semiconductor   (United States)

Author keywords

CD control; Exposure optimization; Photolithography simulation; Process latitude

Indexed keywords

EID: 0011187173     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310791     Document Type: Conference Paper

References (2)

1. Yan Borodovsky, "Impact of Local Partial Coherence Variations on Exposure Tool Performance", Optical/Laser Microlithography, SPIE Vol. 2440, p. 750.
2. Masaya Komatsu, "Three Dimensional Resist Profile Simulation", Optical/Laser Microlithography, SPIE Vol. 1927, p. 413.