Growth mechanism and structure of ti films produced by direct-current magnetron sputtering

Fizika Metallov i Metallovedenie

Volumn 88, Issue 5, 1999, Pages 72-77

  Perekrestov, V I ^a   Kravchenko, S N ^a   Pavlov, A V ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011154517     PISSN: 00153230     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. Popeller M., Abermann R. Influence of substrate properties on the growth of titanium films (Part II) // Thin Solid Films. 1997. Jfc 300. P. 12-17.
2. Checchetto R. Titanium thin film deposition in a deuterium atmosphere // Thin Solid Films. 1997. No 302. P. 77-83.
3. Yu R.C., Wang W.K. Formation of Ti amorphous films deposited on liquid nitrogen-cooled substrates by ionbeam sputtering // Thin Solid Films. 1997. J£ 302. P. 108-110.
4. Kasukabe Y., Yamada Y., Bursill LA. Epitaxial cubic and hexagonal crystallites in titanium thin films evaporated onto sodium chloride substrates // Phyl. Mag. A. 1993. No 1(67). P. 73-85.