Abrupt reduction in poly-Si etch rate in HBr/O2 plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1846-1850

  Kuroda, Shinji ^a   Iwakuro, Hiroaki ^b  

^a OSAKA UNIVERSITY   (Japan)

^b Shindengen Electric Manufacturing Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010819049     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

1. L. Y. Tsou, J. Electrochem. Soc. 136, 3003 (1989).
2. M. Nakamura, K. Iizuka, and H. Yano, Jpn. J. Appl. Phys., Part 1 28, 2142 (1989).
3. O. S. Nakagawa, S. Ashok, and J. K. Kruger, J. Appl. Phys. 69, 2057 (1991).
4. C. J. Mogab, A. C. Adams, and D. L. Flamm, J. Appl. Phys. 49, 3796 (1978).
5. R. d'Agostino, F. Cramarossa, S. D. Benedictis, and G. Ferraro, J. Appl. Phys. 52, 1259 (1981).
6. A. A. Bright and S. Kaushik, J. Vac. Sci. Technol. B 7, 542 (1989).
7. T. M. Bestwick and G. S. Oehrlein, J. Vac. Sci. Technol. A 8, 1696 (1990).
8. S. Iwata and A. Ishizaka, J. Appl. Phys. 79, 6653 (1996).
9. L. J. Scofield, J. Electron. 8, 129 (1976).
10. M. F. Hochella and A. H. Carim, Surf. Sci. Lett. 197, L260 (1988).
11. R. C. Weast, CRC Handbook of Chemistry and Physics (Chemical Rubber, West Palm Beach, FL, 1989), p. B-126.
12. R. C. Weast, CRC Handbook of Chemistry and Physics (Chemical Rubber, West Palm Beach, FL, 1989), p. F-175.
13. C. J. Mogab, A. C. Adams, and D. L. Flamm, J. Appl. Phys. 49, 3796 (1978).