Fabrication of nanometer-size Si wires using a bevel SiO2 wall as an electron cyclotron resonance plasma etching mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 3, 1997, Pages 543-547

  Ishii, Kenichi ^a   Suzuki, Eiichi ^a   Sekigawa, Toshihiro ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010157479     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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