"Safe" solvent resist process for sub-quarter micron T-gates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2916-2920

  Via, D ^a   Bozada, C ^a   Cerny, C ^a   DeSalvo, G ^a   Dettmer, R ^a   Ebel, J ^a   Gillespie, J ^a   Jenkins, T ^a   Nakano, K ^a   Pettiford, C ^a   Quach, T ^a   Sewell, J ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009931275     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589754     Document Type: Article

References (11)

1. D. R. Brambley and R. H. Bennett, GEC J. Res. 13, 42 (1996).
2. Z. C. Tan and S. E. Silverman, Proc. SPIE 1263, 217 (1990).
3. N. Samoto, Y. Makino, K. Onda, E. Mizuki, and T. Itoh, J. Vac. Sci. Technol. B 8, 1335 (1990).
4. R. C. Tiberio, J. M. Linber, G. J. Galvin, and E. D. Wolf, Proc. SPIE 1089, 124 (1989).
5. I. V. Zubeck and Z. C. Tan, Proc. SPIE 923, 257 (1988).
6. P. C. Chao, P. M. Smith, S. C. Palmateer, and J. C. Hwang, IEEE Trans. Electron Devices ED-32, 1042 (1985).
7. P. C. Chao, P. M. Smith, S. Wanuga, J. C. M. Hwang, W. H. Perkins, R. Tiberio, and E. D. Wolf, Tech. Dig. Int. Electron Devices Meet. 613 (1983).
8. Y. Todokoro, IEEE Trans. Electron Devices ED-27, 1443 (1980).
9. M. Hatzakis, J. Vac. Sci. Technol. 16, 1984 (1979).
10. Microlithography Chemical Corp., 1254 Chestnut St., Newton, MA 02164 (617)965-5511.
11. K. M. Renaldo, H. G. Henry, H. C. Cramer, and K. D. Larson, Proc. GaAs Man Tech. (1996), p. 152.