On the use of total reflection x-ray topography for the observation of misfit dislocation strain at the surface of a Si/Ge-Si heterostructure

Applied Physics Letters

Volumn 77, Issue 11, 2000, Pages 1644-1646

  McNally, Patrick J ^a   Dilliway, G ^b   Bonar, J M ^b   Willoughby, A ^b   Tuomi, T ^c   Rantamaki R ^c   Danilewsky, A N ^d   Lowney, D ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^c AALTO UNIVERSITY   (Finland)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009644787     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1308269     Document Type: Article

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