Femtosecond X-ray diffraction: Experiments and limits

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4143, Issue , 2001, Pages 26-37

  Wark, J S ^a   Allen, A M ^a   Ansbro, P C ^a   Bucksbaum, P H ^b   Chang, Z ^b   DeCamp, M ^b   Falcone, R W ^c   Heimann, P A ^d   Johnson, S L ^c   Kang, I ^c   Kapteyn, H C ^b   Lee, R W ^f   Merlin, R ^b   Naylor, G ^g   Padmore, H A ^d   Reis, D A ^b   Sjoegren, A ^e   Wulff, M ^g  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b UNIVERSITY OF MICHIGAN   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e LUND INSTITUTE OF TECHNOLOGY   (Sweden)

^f LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^g EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Coherent phonons; Femtosecond diffraction; Time resolved diffraction

Indexed keywords

COMPUTER SIMULATION; FREE ELECTRON LASERS; IRRADIATION; LASER APPLICATIONS; LASER PULSES; MONOCHROMATORS; PHONONS; SEMICONDUCTOR MATERIALS; SYNCHROTRON RADIATION;

COHERENT PHONONS; FEMTOSECOND X RAY DIFFRACTION; FEMTOSECOND X RAY FREE ELECTRON LASER X RAY PULSES; FINITE RESPONSE TIME; LASER IRRADIATED SEMICONDUCTORS; NONTHERMAL MELT; SUBPICOSECOND DOMAIN; TIME RESOLVED DIFFRACTION;

X RAY DIFFRACTION ANALYSIS;

EID: 0009353889     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.413690     Document Type: Article

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