Modeling the growth of thin silicon oxide films on silicon

Journal of Applied Physics

Volumn 80, Issue 4, 1996, Pages 2467-2470

  Dimitrijev, Sima ^a   Harrison, H Barry ^a  

^a GRIFFITH UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009150847     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363050     Document Type: Article

References (19)

1. TSUPREM-4. Two-Dimensional Process Simulation Program, Version 6.3, Technology Modeling Associates, 1995, pp. 2-24.
2. B.E. Deal and AS Grove, J. Appl. Phys. 36, 3770 (1965).
3. E.A. Irene, J. Electrochem. Soc. 125, 1709 (1978).
4. J.D. Plummer and B.E. Deal, in Process and Device Simulation for MOSVLSI Circuits, edited by P.A. Antognetti, D.A. Antoniadis, R.W. Dutton, and W.G. Oldman, NATO ASI Series, No. 62 (Martinus, Wijhoff, 1983).
5. E.P. Gusev, H.C. Lu, T. Gustafsson, and E. Garfunkel, Phys. Rev. B 52, 1759 (1995).
6. S. Dimitrijev, D. Sweatman, and H.B. Harrison, Appl. Phys. Lett. 62, 1539 (1993).
7. TM4 SUPREM-3, One-Dimensional Process Simulation Program, Version 6.1, Technology Modeling Associates, 1994, pp. 2-56.
8. S. Dimithrijev, H.B. Harrison, and D. Sweatman, in Microelectronics Technology and Process Integration, edited by F.E. Chen and S.P. Murarka, Proc. SPIE 2335 (SPIE Bellingham, 1994), pp. 271-281.
9. S. Dimitrijev, H.B. Harrison, and D. Sweatman, IEEE Trans. Electron Devices ED-43, 267 (1996).
10. F.J. Grunthaner and P.J. Grunthaner, Mater. Sci. Rep. 1, 65 (1986).
11. F.J. Himpsel, F.R. McFeely, A. Taleb-Ibrahimi, J.A. Yarmoff, and G. Hollinger, Phys. Rev. B. 38, 6084 (1988).
12. J.J. Ganem, G. Battistig, S. Rigo, and I. Trimaille, Appl. Sci. 65/66, 647 (1993).
13. E. Irene, Thin Solid Films 233, 96 (1993).
14. P.E. Batson, Nature 366, 727 (1993).
15. W.A. Tiller, J. Electrochem. Soc. 128, 689 (1981).
16. T. Dunham and J.D. Plummer, J. Appl. Phys. 59, 2541 (1986).
17. K. Taniguchi, Y. Shibata, and C. Hamaguchi, J. Appl. Phys. 65, 2723 (1989).
18. S. Kamohara and Y. Kamigaki, J. Appl. Phys. 69, 7871 (1991).
19. S.M. Hu, Appl. Phys. 45, 1567 (1974).