Chemical analysis of thin films by means of SS-MS, GD-OES, and XPS demonstrated at Ir-Si thermoelectrica

Fresenius' Journal of Analytical Chemistry

Volumn 363, Issue 2, 1999, Pages 179-184

  Kurt, R ^a   Hoffmann, V ^a   Reiche, R ^a   Pitschke, W ^a   Wetzig, K ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009101202     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160051167     Document Type: Article

References (13)

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