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Volumn 2001-January, Issue , 2001, Pages 12-16

Is product screen enough to guarantee low failure rate for the customer?

Author keywords

Acceleration; CMOS process; CMOS technology; Condition monitoring; Implants; MOSFET circuits; Process control; Stress; Testing; Voltage

Indexed keywords

ACCELERATION; CMOS INTEGRATED CIRCUITS; CONDITION MONITORING; DAMAGE DETECTION; DEFECTS; DENTAL PROSTHESES; ELECTRIC POTENTIAL; PROCESS CONTROL; STRESSES; TESTING;

EID: 0008993509     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2001.922874     Document Type: Conference Paper
Times cited : (2)

References (6)
  • 4
    • 0017491527 scopus 로고
    • A New Preferential Etch for Defects in Silicon Crystals
    • M. Wright-Jenkins, "A New Preferential Etch for Defects in Silicon Crystals", in J. Electrochem. Soc. 124, 1977, p.757-62.
    • (1977) J. Electrochem. Soc. , vol.124 , pp. 757-762
    • Wright-Jenkins, M.1
  • 5
    • 0026869985 scopus 로고
    • A new Shift and Ratio Method for Mosfet Channel Length Extraction
    • Y. Taur et al., "A new Shift and Ratio Method for Mosfet Channel Length Extraction", in IEEE Electron Device Lett., Vol 13, 1992, p267-269.
    • (1992) IEEE Electron Device Lett. , vol.13 , pp. 267-269
    • Taur, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.