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Volumn 27, Issue 4, 1998, Pages 345-352

Nanometer-scale investigation of metal-SiC interfaces using ballistic electron emission microscopy

Author keywords

Ballistic electron emission microscopy (BEEM); Metal semiconductor interface; Scanning tunneling microscopy (STM); Schottky barrier; Silicon carbide (SiC)

Indexed keywords


EID: 0008649722     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-998-0413-8     Document Type: Article
Times cited : (17)

References (21)
  • 1
    • 0003660629 scopus 로고
    • Committee on Materials for High-Temperature Semiconductor Devices, Washington, D.C.: National Academy Press
    • Materials for High-Temperature Semiconductor Devices, Committee on Materials for High-Temperature Semiconductor Devices, Washington, D.C.: National Academy Press, 1995).
    • (1995) Materials for High-Temperature Semiconductor Devices
  • 6
    • 0000392344 scopus 로고
    • W.J. Kaiser and L.D. Bell, Phys. Rev. Lett. 60, 1406 (1988); L.D. Bell and W.J. Kaiser, Phys. Rev. Lett. 61, 2368 (1988).
    • (1988) Phys. Rev. Lett. , vol.60 , pp. 1406
    • Kaiser, W.J.1    Bell, L.D.2
  • 7
    • 17244365811 scopus 로고
    • W.J. Kaiser and L.D. Bell, Phys. Rev. Lett. 60, 1406 (1988); L.D. Bell and W.J. Kaiser, Phys. Rev. Lett. 61, 2368 (1988).
    • (1988) Phys. Rev. Lett. , vol.61 , pp. 2368
    • Bell, L.D.1    Kaiser, W.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.