Metalorganic chemical vapor deposition of SnO2 thin films using tetraethyltin: Growth and characterization

Annales de Chimie: Science des Materiaux

Volumn 23, Issue 1-2, 1998, Pages 355-358

  Amjoud, M ^a,c   Maury, F ^b   Elaatmani, M ^c  

^a FACULTÉ DES SCIENCES ET TECHNIQUES GUÉLIZ   (Morocco)

^b CNRS   (France)

^c FACULTÉ DES SCIENCES SEMLALIA   (Morocco)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008311918     PISSN: 01519107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0151-9107(98)80091-3     Document Type: Article

References (9)

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4. 2 films by ethanolamine alkoxide method, J. Electrochem. Soc. 1990, 137, 267.
5. 2 thin films, J. Physique, Coll. C5, 1989, 5, 605.
6. CHAMBOULEYRON (I.), CONSTANTINO (C.), JOUSSE (D.), ASSUMPCAO (R.), BRENZIKOFER (R.), Electrical and optical properties of amorphous tin oxide, J. Physique, Coll C4, 1981, 42, 1009.
7. 2 thin films, J. Mater. Res. 1994, 9, 663.
8. 2 formation, J. Electrochem. Soc. 1978, 125, 110.
9. 2-based elements, Sensors and Actuators B, 1991, 3, 147.