Free electron laser annealing of N-ion-implanted 3C-SiC films

Applied Physics Letters

Volumn 71, Issue 6, 1997, Pages 823-825

  Ohyama, Hideaki ^a   Suzuki, Toshiji ^a   Nishi, Kazuhisa ^a   Mitsuyu, Tsuneo ^a   Tomimasu, Takio ^a  

^a Free Electron Laser Research Institute Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007389453     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119668     Document Type: Article

References (11)

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