Free electron laser annealing of amorphous silicon carbide

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 6 A, 1996, Pages

  Ohyama, H ^a   Suzuki, T ^a   Nishi, K ^a   Mitsuyu, T ^a   Tomimasu, T ^a  

^a Free Electron Laser Research Institute Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CARBIDES; CRYSTALLIZATION; IRRADIATION; SUPERCONDUCTING MATERIALS;

AMORPHOUS SILICON CARBIDE; LASER ANNEALING; STRETCH MODE;

FREE ELECTRON LASERS;

EID: 0030171388     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l683     Document Type: Article

References (8)