Surface layer impurities on silicon spheres used in determination of the Avogadro constant

IEEE Transactions on Instrumentation and Measurement

Volumn 48, Issue 2, 1999, Pages 233-237

  Kenny, Michael J ^a   Netterfield, Roger P ^a   Wielunski, Leszek S ^a   Beaglehole, David ^b  

^a CSIRO   (Australia)

^b VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

Author keywords

Avogadro constant; Ellipsometry; Ion beam analysis; Oxide layers; Single crystal silicon

Indexed keywords

EID: 0007364695     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/19.769571     Document Type: Article

References (10)

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