Modelling of plasma surface interactions

Vide: Science, Technique et Applications

Volumn 52, Issue 280, 1996, Pages 185-203

  Rhallabi, A ^a   Gogolides, E ^b   Turban, G ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Deposition; Etching; Modelling; Plasma; Surface; Thin films

Indexed keywords

EID: 0007091527     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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