Analytical Characterization of Microlithographically Fabricated Iridium-Based Ultramicroelectrode Arrays

Electroanalysis

Volumn 10, Issue 2, 1998, Pages 89-93

  Feeney, Rosemary ^a   Herdan, Janet ^a   Nolan, Melissa A ^a   Tan, Sandie H ^a   Tarasov, Vladislav V ^a   Kounaves, Samuel P ^a  

^a TUFTS UNIVERSITY   (United States)

Author keywords

Mercury coated iridium ultramicroelectrode arrays; Microlithography; Stripping voltammetry

Indexed keywords

ATOMIC FORCE MICROSCOPY; CADMIUM; FABRICATION; IRIDIUM; MICROELECTRODES; SILICON NITRIDE; STRIPPING VOLTAMMETRY;

ACETATE BUFFERS; ANALYTICAL CHARACTERIZATION; ANALYTICAL PERFORMANCE; ARRAY SURFACE; FABRICATION PROCESS; INSULATING LAYERS; MERCURY-COATED IRIDIUM ULTRAMICROELECTRODE ARRAY; SQUARE WAVE ANODIC STRIPPING VOLTAMMETRY; STRIPPING VOLTAMMETRY; ULTRAMICROELECTRODE ARRAYS;

SILICA;

EID: 0006822099     PISSN: 10400397     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4109(199802)10:2<89::AID-ELAN89>3.0.CO;2-J     Document Type: Article

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