Advanced application of hierarchy reorganisation in E-beam lithography

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 77-80

  Rosenbusch, A ^a   Kalus, C K ^a   Hofmann, U ^a   Irmscher, M ^b  

^a Sigma C GmbH   (Germany)

^b Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR ARRAYS; DATA PROCESSING; DATA STORAGE EQUIPMENT; HIERARCHICAL SYSTEMS; INTEGRATED CIRCUITS; LOGIC DEVICES; RESPONSE TIME (COMPUTER SYSTEMS);

DATA PREPARATION; ELECTRON BEAM PROXIMITY EFFECT CORRECTION; GIGABYTES; HIERARCHY REORGANISATION; MEMORY CHIPS; RANDOM LAYOUTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029732125     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00199-9     Document Type: Article

References (2)

1. A. Rosenbusch, C.K. Kalus, U. Hofmann, H. Endo, Y. Kimura, A. Endo A Means to Enhance Efficiency in E-beam and Optical Lithography, in press at JJAP
2. U. Hofmann, C.K. Kalus, A. Rosenbusch, H. Endo, Y. Kimura, A. Endo: Hierarchical Proximity Correction using CAPROX. in press BACUS Proceedings, SPIE 1995