Properties of interface states at Ta2O5/n-Si interfaces

Journal of Applied Physics

Volumn 84, Issue 1, 1998, Pages 335-338

  Zhang, S K ^a   Fu, Z W ^a   Ke, L ^a   Lu, F ^a   Qin, Q Z ^a   Wang, Xun ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005879922     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368032     Document Type: Article

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