Linear array of complementary metal oxide semiconductor double-pass metal micromirrors

Optical Engineering

Volumn 36, Issue 5, 1997, Pages 1391-1398

  Bühler, Johannes ^a   Steiner, Franz Peter ^a   Hauert, Roland ^b   Baltes, Henry ^a  

^a ETH ZURICH   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Deformable micromirror; Double pass metal; Micro opto electro mechanical systems; Micromirror array; Spatial light modulator; Surface micromachining; Torsional micromirror

Indexed keywords

EID: 0005503824     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.601346     Document Type: Article

References (12)

1. L. J. Hornbeck, "Digital light processing and MEMS: timely convergence for a bright future," Proc. SPIE 2642, 2 (1995); preprint available from Texas Instruments, Dallas, Texas.
2. C. W. Storment, D. A. Borkholder, V. Westerlind, J. W. Suh, N. I. Maluf, and G. T. A. Kovacs, "Flexible, dry-released process for aluminum electrostatic actuators," J. Microelectromech. Syst. 3(3), 90-96 (1994).
3. K. E. Mattson, "Surface micromachined scanning mirrors," Microelectronic Eng. 19, 199-204 (1992).
4. V. P. Jaecklin, C. Linder, N. F. de Rooij, J.-M. Moret, and R. Vuilleumier, "Line-addressable torsional micromirrors for light modulator arrays," Sensors and Actuators A 41-42, 324-329 (1994).
5. N. C. Tien, O. Solgaard, M.-H. Kiang, M. Daneman, K. Y. Lau, and R. S. Muller, "Surface-micromachined mirrors for laser-beam positioning," in Digest of Technical Papers, The 8th International Conf. on Solid-State Sensors and Actuators (Transducers '95), Vol. 2, pp. 352-355, Stockholm, Sweden (1995).
6. M. B. Fischer, H. Graef, and W. von Münch, "Electrostatically deflectable polysilicon torsional mirrors," Sensors and Actuators A 44, 83-89 (1994).
7. J. Bühler, J. Funk, F.-P. Steiner, P. M. Sarro, and H. Baltes, "Double pass metallization for CMOS aluminum actuators," in Digest of Technical Papers, The 8th International Conf. on Solid State Sensors and Actuators (Transducers '95), Vol. 2, pp. 360-363, Stockholm, Sweden (1995).
8. Etchant No. 17668, Riedel-deHäen, Seelze, Germany (1995).
9. P. A. Flinn, "Principles and applications of wafer curvature techniques for stress measurements in thin films," Mat. Res. Soc. Symp. Proc. 130, 41-50 (1989).
10. D. Y. Smith, E. Shiles, and M. Inokuti, "The optical properties of metallic aluminum," in Handbook of Optical Constants of Solids, pp. 369-406, Academic Press, Orlando (1985).
11. S. Hofmann, in Practical Surface Analysis, D. Briggs and M. P. Seah, Eds., pp. 143-194, Wiley, New York (1990).
12. J. Funk, J. G. Korvink, M. Bächtold, J. Bühler, and H. Baltes, "Coupled 3D thermo-electro-mechanical simulations of microactuators," in Proc. IEEE Workshop on Microelectromechanical Systems, pp. 133-138, San Diego, CA (1996).