Non-contact measurements of the minority carrier recombination lifetime at the silicon surface

ASTM Special Technical Publication

Volumn , Issue 1340, 1998, Pages 147-155

  Kamieniecki, Emil ^a  

^a QC Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; FREQUENCY MODULATION; LIGHT; SUBSTRATES; SURFACE MEASUREMENT; SURFACES;

CHARGE PROFILER; HIGH MODULATION FREQUENCY; LOW LIGHT INTENSITY; MINORITY CARRIER RECOMBINATION LIFETIME; NON CONTACT MEASUREMENT; RECOMBINATION; SURFACE REGION EFFECTS;

SEMICONDUCTING SILICON;

EID: 0005005424     PISSN: 10403094     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1520/stp15701s     Document Type: Article

References (13)

1. Kamieniecki, E., "Noninvasive Method and Apparatus for Characterization of Semiconductors", U.S. Patent 4,544,887, October 1985.
2. Kamieniecki, E., "Surface Photovoltage Measured Capacitance: Application to Semiconductor/Electrolyte System", J. Appl. Phys. Vol. 54, No. 11, November 1983, pp. 6481-6487.
3. Kamieniecki, E. and Foggiato, J., "Analysis and Control of Electrically Active Contamination by Surface Charge Analysis", Handbook of Silicon Wafer Cleaning Technology, W. Kern, Editor, Noyes Publications, 1993, Chapter 11, pp. 497-536.
4. Buczkowski, A., Radzyminski, Z.J., Rozgonyi, G.A., and Shimura, F., "Separation of the bulk and surface components of recombination lifetime obtained with a single laser/microwave photoconductance technique", J. Appl. Phys. Vol. 72, No. 7, October 1992, pp. 2873-2878.
5. Tohru Hara, Fumio Tamura and Taira Kitamura, "Minority Carrier Lifetime Measurement in Epitaxial Silicon Layers", J. Electrochem. Soc., Vol. 144, No. 4, April 1997, pp. L54-L57.
6. Theory of Operation. Surface Charge Profiler, QC Solutions, Inc., Woburn, Mass., U.S.A.
7. Kamieniecki, E., patent pending.
8. Kamieniecki, E., "Non-Contact Electrical Characterization of Silicon Surfaces for In-Line Monitoring of Cleaning Processes", Proc. Fourth Intern. Symp. On Cleaning Technol. in Semicon. Dev. Manufacturing, Eds. R. Novak and J. Ruzyllo, The Electrochem. Soc., Vol. 95-20, pp. 332-343, 1996.
9. Tardif, F., Joly, J.P., and Walz, D., "Monitoring of Metallic Contamination by Direct and Indirect Analytical Methods: Application to Cleaning Processes in IC Manufacturing", Proc. Conf. ALTECH 95, Den Haag, The Netherlands, Sep. 28-29, 1995.
10. Kamieniecki, E., and Ruzyllo, J., patent pending.
11. Sze, S.M., Physics of Semiconductor Devices (Wiley, New York, 1981), Chapter 7.
12. 2 Interface - Electrical Properties as Determined by the MIS Conductance Technique", Bell Syst. Tech. J., Vol. 46, 1967, p. 1055.
13. Roman, P., Hwang, D., Torek, K., Ruzyllo, J., and Kamieniecki, E., "Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements", Proc. Ultraclean Semicon. Processing Technol. and Surface Chemical Cleaning and Passivation, Eds. M. Liehr, M. Heyns, M. Hirose and H. Parks, Mat. Res. Soc., Vol. 386, 1995, pp. 401-406.