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Volumn 42, Issue 1-3, 1996, Pages 260-264

EBIC study of recombination activity of oxygen precipitation related defects in Si

Author keywords

Oxygen precipitates; Recombination sites; Silicon

Indexed keywords

ACTIVATION ENERGY; COMPOSITION EFFECTS; CONTAMINATION; DISLOCATIONS (CRYSTALS); ELECTRIC PROPERTIES; ELECTRON BEAMS; INDUCED CURRENTS; OXYGEN; PRECIPITATION (CHEMICAL);

EID: 0004857188     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01718-7     Document Type: Article
Times cited : (33)

References (12)
  • 1
    • 0001673843 scopus 로고
    • T.S. Moss and S. Mahajan (eds.), Elsevier, New York
    • H. Bender and J. Vanhellemont, in T.S. Moss and S. Mahajan (eds.), Handbook on Semiconductors, Vol. 3, Elsevier, New York, 1994, p. 1637.
    • (1994) Handbook on Semiconductors , vol.3 , pp. 1637
    • Bender, H.1    Vanhellemont, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.