Materials characterization of plasma deposited copolymers using cfc-113, cfc-12 and pfc-116 with c2h4 monomers

Journal of Photopolymer Science and Technology

Volumn 11, Issue 2, 1998, Pages 307-312

  Tsuji, Osamu ^a   Minaguchi, Takeshi ^a   Yoshimura, Kikuko ^a   Nakano, Hirohiko ^a   Tatsuta, Toshiaki ^a  

^a 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

Cfcs ethylene mixed monomer; Chlorofluorocarbon; Low dielectric constant; Plasma copolymer

Indexed keywords

EID: 0004767688     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.11.307     Document Type: Article

References (11)

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