Materials characterization of plasma deposited copolymer using CFC-113 with C2H4 monomer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4964-4967

  Tsuji, Osamu ^a   Minaguchi, Takeshi ^a   Nakano, Hirohiko ^a   Tatsuta, Toshiaki ^a  

^a 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

Bond strength; CFCs copolymer films; Low dielectric constant; Plasma copolymer; Thermal stability

Indexed keywords

BOND STRENGTH (CHEMICAL); CHLOROFLUOROCARBONS; COMPOSITION EFFECTS; CONTACT ANGLE; ELECTRIC BREAKDOWN OF SOLIDS; FILM GROWTH; MONOMERS; PERMITTIVITY; PLASMA APPLICATIONS; PLASTIC FILMS; PRESSURE EFFECTS; THERMODYNAMIC STABILITY;

PLASMA COPOLYMERS;

COPOLYMERS;

EID: 0031177254     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4964     Document Type: Article

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