In situ cleaning of GaAs and AlxGa1-xAs surfaces and production of ohmic contacts using an atomic hydrogen source based on a reflected arc discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1488-1493

  Kagadei, V A ^a   Proskurovsky, D I ^b  

^a Research Institute of Semiconductor Devices   (Russian Federation)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004522824     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581841     Document Type: Article

References (19)

1. M. Hong, K. D Choquette, J. P. Mannaerts, L. H. Grober, R. S. Freund, D. Vakshoori, S. N. G. Chu, H. S. Luftman, and R. C. Wetzel, J. Electron. Mater. 23, 625 (1994).
2. T. Sugaya and M. Kawabe, Jpn. J. Appl. Phys., Part 2 30, L402 (1991).
3. Z. Lu, M. T. Schmidt, D. Chen, R. M. Osgood, W. M. Holber, D. V. Podlesnik, and J. Forster, Appl. Phys. Lett. 58, 1143 (1991).
4. L. M. Weegels, T. Saitoh, H. Ooashi, and H. Kanbe, Appl. Phys. Lett. 64, 2661 (1994).
5. L. M. Weegels, T. Saitoh, and H. Kanbe, Appl. Phys. Lett. 65, 3117 (1994).
6. Y. Sukamoto, T. Sugino, H. Ninomiya, K. Matsuda, and J. Shirafuji, Jpn. J. Appl. Phys., Part 1 34, 1417 (1995).
7. V. A. Kagadei, D. I. Proskurovsky, S. D. Reger, and L. M. Romas, Mikroelektronika 27, 10 (1998).
8. Z. Lilental-Weber, N. Newman, J. Washburn, and E. R. Weber, Appl. Phys. Lett. 54, 356 (1989).
9. A. Paccagnella, A. Callegari, A. Carnera, M. Gasser, E. Latta, M. Murakami, and M. Norcott, J. Appl. Phys. 69, 2356 (1991).
10. A. Callegari, P. D. Hoh, D. A. Buchman, and D. Lacey, Appl. Phys. Lett. 54, 332 (1989).
11. V. A. Kagadei and D. I. Proskurovsky, J. Vac. Sci. Technol. A 16, 2556 (1998).
12. K. D. Choquette, M. Hong, S. N. G. Chu, H. S. Luftman, and J. P. Mannaerts, Appl. Phys. Lett. 62, 735 (1993).
13. G. M. Mikhailov, P. V. Bulkin, S. A. Shudobin, A. A. Chumakov, and S. Yu. Shapoval, Vacuum 43, 199 (1992).
14. M. Yamada, Y. Ide, and K. Tone, Jpn. J. Appl. Phys., Part 2 31, L1157 (1992).
15. M. Yamada and Y. Ide, Jpn. J. Appl. Phys., Part 2 33, L671 (1994).
16. N. Braslau, J. Vac. Sci. Technol. B 1, 700 (1983).
17. W. O. Barnard, H. J. Strydom, M. M. Kruger, C. Schildhauer, and B. M. Lacquet, Nucl. Instrum. Methods Phys. Res. B 35, 238 (1988).
18. A. Katz, C. R. Abernathy, S. J. Pearton, B. E. Weir, and W. Savin, J. Appl. Phys. 69, 3376 (1991).
19. V. G. Keramidas, Proceedings of the Seventh International Symposium, St. Louis, MO, 1978 (Bristol, London, 1979), p. 396.