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Volumn 70, Issue 2, 1999, Pages 1530-1534

Dual-function circular polarization converter for microwave/plasma processing systems

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004177102     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149619     Document Type: Article
Times cited : (20)

References (21)
  • 1
    • 85034120562 scopus 로고
    • edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood Noyes, New Jersey, Chap. 11
    • J. Asmussen. Handbook of Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood (Noyes, New Jersey, 1990), Chap. 11.
    • (1990) Handbook of Plasma Processing Technology
    • Asmussen, J.1
  • 2
    • 0000086435 scopus 로고
    • edited by M. H. Francombe, and J. L. Vossen Academic, New York
    • O. A. Popov, Physics of Thin Film, edited by M. H. Francombe, and J. L. Vossen (Academic, New York, 1994), pp. 121-233.
    • (1994) Physics of Thin Film , pp. 121-233
    • Popov, O.A.1
  • 3
    • 0041673821 scopus 로고
    • edited by O. A. Popov Noyes, New Jersey, Chap. 7
    • J. E. Stevens, High Density Plasma Sources, edited by O. A. Popov (Noyes, New Jersey, 1995), Chap. 7.
    • (1995) High Density Plasma Sources
    • Stevens, J.E.1
  • 4
    • 0001890931 scopus 로고
    • edited by M. H. Francome and J. L. Vossen Academic, New York
    • M. A. Lieberman and R. A. Gottscho, Physics of Thin Film, edited by M. H. Francome and J. L. Vossen (Academic, New York, 1994), pp. 25-40.
    • (1994) Physics of Thin Film , pp. 25-40
    • Lieberman, M.A.1    Gottscho, R.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.