Photolithography process modeling using neural networks

Semiconductor International

Volumn 19, Issue 6, 1996, Pages

  Cardarelli, G ^a   Palumbo, M ^a   Pelagagge, P M ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ENVIRONMENTAL TESTING; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; NEURAL NETWORKS; PROCESS CONTROL; SPATIAL VARIABLES CONTROL; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION CONTROL; NEURAL NETWORK MODELS; PATTERN DIMENSION; TEST WAFERS; ULTRAVIOLET EXPOSURE ENERGY;

PHOTOLITHOGRAPHY;

EID: 0030167498     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)