A review of ion beam induced charge microscopy for integrated circuit analysis

Materials Science and Engineering B

Volumn 42, Issue 1-3, 1996, Pages 67-76

  Breese, M B H ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Charge microscopy; Ion beam; Semiconductor wafers

Indexed keywords

DISLOCATIONS (CRYSTALS); IMAGING TECHNIQUES; INDUCED CURRENTS; ION BEAMS; LIGHT SCATTERING; MICROSCOPIC EXAMINATION;

ELECTRON BEAM INDUCED CURRENT (EBIC) MICROSCOPY; ION BEAM INDUCED CHARGED (IBIC) MICROSCOPY; SEMICONDUCTOR WAFERS;

INTEGRATED CIRCUITS;

EID: 0003697156     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01685-6     Document Type: Review

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