Thermally stable, soft FeXN thin films

Applied Physics Letters

Volumn 77, Issue 3, 2000, Pages 426-428

  Liu, yi Kuang ^a   Kryder, M H ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003231205     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126998     Document Type: Article

References (3)

1. W. P. Jayasekara, S. Wang, and M. H. Kryder, J. Appl. Phys. JAPIAU 79, 5880 (1996).
2. M. K. Minor and J. A. Barnard, J. Appl. Phys. JAPIAU 85, 4565 (1999).
3. L. Néel, J. Phys. Radium JPRAAJ 13, 249 (1952).