Effect of temperature on Ti and TiN films deposited on a BN substrate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1901-1906

  Seal, S ^a,f   Underwood, H ^a   Uda, M ^b   Osawa, H ^b   Kanai, A ^b   Barr, T L ^c   Benko, E ^d   Krauss, A ^e   Perera, R C C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b WASEDA UNIVERSITY   (Japan)

^c Wisconsin University   (United States)

^d Institute of Cutting Tools   (Poland)

^e ARGONNE NATIONAL LABORATORY   (United States)

^f University of Central Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; CHEMICAL BONDINGS; CHEMICAL FEATURES; EFFECT OF TEMPERATURE; PHASE FORMATIONS; SECONDARY ION MASS SPECTROSCOPY; TIN FILMS; TIO; WEAR AND CORROSION RESISTANCE;

BORIDES; BORON NITRIDE; CHEMICAL BONDS; CORROSION RESISTANCE; ELECTRONIC PROPERTIES; INDUSTRIAL APPLICATIONS; PLASMA DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; SYNCHROTRON RADIATION; TITANIUM NITRIDE; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 0002987052     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581125     Document Type: Article

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