Effects of preirradiation and thermal annealing on photoinduced defects creation in synthetic silica glass

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 3497-3501

  Saito, K ^a   Ikushima, A J ^a   Kotani, T ^b   Miura, T ^b  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b Kitagawa Industrial Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002960952     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371247     Document Type: Article

References (25)

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