The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 292-305

  McAdams, Christopher L ^a   Yueh, Wang ^a   Tsiartas, Pavlos ^b   Hsieh, Dale ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002737110     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch022     Document Type: Article

References (41)

1. Dill, F. H. IEEE Trans. Elect. Dev. 1975, ED-22 (7), 440-444.
2. Rao, V.; Hinsburg, W. D.; Frank, C. W.; Pease, R. F. W. Proc. SPIE Int. Soc. Opt. Eng. 1993, 1925, 538-551.
3. Arcus, R. A. Proc. SPIE Int. Soc. Opt. Eng. 1986, 631, 124-134.
4. Templeton, M. K.; Szmanda, C. R.; Zampini, A Proc. SPIE Int. Soc. Opt. Eng. 1987, 771, 136-147.
5. Tsiartas, P.C.; Simpson, L. L.; Qin, A.; Willson, C. G.; Allen, R. D.; Krukonis, V. J.; Gallagher-Wetmore, P. M. Proc. SPIE Int. Soc. Opt. Eng. 1995, 2438, 261-271.
6. Hinsberg, W. D.; Gutierrez, M. L. Proc. SPIE Int. Soc. Opt. Eng. 1984, 469, 57-64.
7. Henderson, C. L.; Tsiartas, P. C.; Simpson, L. L.; Clayton, K. D.; Pancholi, S.; Pawloski, A. R.; Willson, C. G. Proc. SPIE Int. Soc. Opt. Eng. 1996, 2724, 481-490.
8. Yeh, T.-F.; Shih, H.-Y.; Reiser, A.; Toukhy, M. A.; Beauchemin, B. T. Jr. J. Vac. Sci. Technol. 1992, 10, 3.
9. Hanabata, M.; Uetani, Y.; Furuta, A. Proc. SPIE Int. Soc. Opt. Eng. 1988, 920, 349-354.
10. Tsiartas, P. C.; Flanagin, L. W.; Henderson, C. L.; Hinsberg, W. D.; Sanchez, I. C.; Bonnecaze, R. T.; Willson, C. G. Macromolecules 1997, 30, 4656-4664.
11. Grant, B.D.; Clecak, N.J.; Tweig, R.J.; Willson, C.G. IEEE Transactions on Electronic Devices 1981, ED-28, 1300-1305.
12. Murata, M.; Koshiba, M.; Harita, Y. Proc. SPIE Int. Soc. Opt. Eng. 1989, 1086, 48-55.
13. Huang, J.-P.; Kwei, T. K.; Reiser, A. Macromolecules 1989, 22, 4106-4112.
14. Yeh, T.-F.; Shih, H.-T.; Reiser, A. Macromolecules 1992, 25, 5345-5352.
15. Yeh, T.-F.; Shih, H.-T.; Reiser, A. Proc. SPIE Int. Soc. Opt. Eng. 1992, 1672, 204-213.
16. Reiser, A.; Lin, C.; Yeh, T. Proc. SPIE Int. Soc. Opt. Eng. 1993, 1925, 647-656.
17. Lin, C. C.; Yeh, T.-F.; Reiser, A.; Honda, K.; Beauchemin, B. T. J. Photopolym. Sci. Technol. 1993, 6 (1), 147-160.
18. Yeh, T.-F.; Reiser, A.; Dammel, R. R.; Pawlowski, G.; Roeschert, H. Proc. SPIE Int. Soc. Opt. Eng. 1993, 1925, 570-581.
19. Shih, H.-T.; Yeh, T.-F.; Reiser, A.; Dammel, R. R.; Merrem, H. J.; Pawlowski, G. Proc. SPIE Int. Soc. Opt. Eng. 1994, 2195, 514-523.
20. Yeh, T.-F.; Huang, J.-P.; Reiser, A.; Honda, K.; Beachemin, B. T.; Hurditch, R. J. Proc. SPIE Int. Soc. Opt. Eng. 1994, 2195, 663-672.
21. Shih, H.-T.; Reiser, A. Proc. SPIE Int. Soc. Opt. Eng. 1995, 2438, 305-311.
22. Shih, H.-Y.; Reiser, A. Macromolecules 1995, 28, 5595-5600.
23. Shih, H.-Y.; Reiser, A. Macromolecules 1996, 29, 2082-2087.
24. Kim, M. S.; Reiser, A. Macromolecules 1997, 30, 4652-4655.
25. Essam, J. W. Rep. Progr. Physics 1980, 43, 833-912.
26. Stauffer, D. Introduction to Percolation Theory; Taylor & Francis, London, 1985.
27. Huang, J.-P.; Kwei, T. K.; Reiser, A Proc. SPIE Int. Soc. Opt. Eng. 1989, 1086, 74-84.
28. Furata, A.; Hanabata, M.; Uemura, Y. J. Vac. Sci. Technol. 1986, B4(1), 430-436.
29. Honda, K.; Beauchemin, Jr., B. T.; Fitzgerald, E. A.; Jeffries, III, A. T.; Tadros, S. P.; Blakeney, A. J.; Hurditch, R. J.; Tan, S.; Sakaguchi, S. Proc. SPIE Int. Soc. Opt. Eng. 1991, 1466, 141-148
30. Templeton, M. K.; Szmanda, C. R.; Zampini, A. Proc. SPIE Int. Soc. Opt. Eng. 1987, 771, 136-147.
31. Coleman, M. M.; Serman, C. J.; Bhagwagar, D. E.; Painter, P. C. Polymer 1990, 30, 1298.
32. Honda, K.; Beauchemin, Jr., B. T.; Hurditch, R. J.; Blakeney, A. J.; Kawabe, Y.; Kobuko, T. Proc SPIE Int. Soc. Opt. Eng. 1990, 1262, 493-500.
33. Borzo, M.; Rafalko, J. J.; Joe, M.; Dammel, R. R.; Rahman, M. D.; Ziliox, M. A. Proc. SPIE Int. Soc. Opt. Eng. 1995, 2438, 294-304.
34. Dammel, R. In Diazonaphthoquinone-based Resisits; O'Shea, D. C., Ed.; Tutorial Text in Optical Engineering; SPIE Optical Engineering Press, Bellingham, Washington, 1993; Vol. TT-11, p 80.
35. Mueller, K. E.; Koros, W. J.; Wang, Y. Y.; Willson, C. G. Proc. SPIE Int. Soc. Opt. Eng. 1997, 3049, 871-873.
36. Gardiner, A. B.; Qin, A.; Henderson, C. L.; Pancholi, S.; Koros, W. J.; Willson, C. G.; Dammel, R. R.; Mack, C.; Hinsberg, W. D. Proc. SPIE Int. Soc. Opt. Eng. 1997, 3049, 850-860.
37. Schlenk. Justus Liebigs Ann. Chem. 1928 463, 120.
38. Arnold, R. T.; Murai, K.; Dodson, R. M. J. Am. Chem. Soc. 1950, 72, 4193-4195.
39. Orchin, M.; Woolfolk, E. O.; Reggel, L. J. Am. Chem. Soc. 1949, 71, 1126-1127.
40. Lowry, T. H.; Richardson, K. S. In Mechanism and Theory in Organic Chemistry 3d; Berger, L. S., Ed.; Harper & Row: New York, New York, 1987; pp 143-159.
41. Liddel, U.; Becker, E. D. Spectrochim. Acta 1957, 10, 70-84.