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Volumn 25, Issue 1, 1999, Pages 57-63

Removal of Trimethylamine and Ammonia Using Electron Attachment Reaction

Author keywords

ammonia; corona discharge reactor; electron attachment; gas purification; trimethylamine

Indexed keywords


EID: 0002248231     PISSN: 15131874     EISSN: None     Source Type: Journal    
DOI: 10.2306/scienceasia1513-1874.1999.25.057     Document Type: Article
Times cited : (6)

References (9)
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    • (in Japanese)
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    • Nishida, K1    Matsuda, Y2
  • 2
    • 85004650674 scopus 로고
    • A new method of gas mixture separation based on selective electron attachment
    • Tamon H, Yano H and Okazaki M (1989) A new method of gas mixture separation based on selective electron attachment. Kagaku Kogaku Ronbunshu 15, 663-8.
    • (1989) Kagaku Kogaku Ronbunshu , vol.15 , pp. 663-668
    • Tamon, H1    Yano, H2    Okazaki, M3
  • 3
    • 0004118412 scopus 로고
    • 3rd ed, Cambridge Univ. Press, Cambridge, England
    • Massay SH (1976) Negative Ions. 3rd ed, pp 156-241. Cambridge Univ. Press, Cambridge, England.
    • (1976) Negative Ions , pp. 156-241
    • Massay, SH1
  • 4
    • 0000335017 scopus 로고
    • A survey of the gas-phase negative ion kinetics of inorganic molecules - electron attachment reactions
    • Caledonia GE (1975) A survey of the gas-phase negative ion kinetics of inorganic molecules - electron attachment reactions. Chem Rev 75, 333-51.
    • (1975) Chem Rev , vol.75 , pp. 333-351
    • Caledonia, GE1
  • 5
    • 0029328802 scopus 로고
    • New concept of gas purification by electron attachment
    • Tamon H et al (1995) New concept of gas purification by electron attachment AIChE J 41, 1701-11.
    • (1995) AIChE J , vol.41 , pp. 1701-1711
    • Tamon, H1
  • 6
    • 0030131333 scopus 로고    scopus 로고
    • Influence of oxygen and water vapor on removal of sulfur compounds by electron attachment
    • Tamon H, Sano N and Okazaki M (1996) Influence of oxygen and water vapor on removal of sulfur compounds by electron attachment. AIChE J 42, 1481-6.
    • (1996) AIChE J , vol.42 , pp. 1481-1486
    • Tamon, H1    Sano, N2    Okazaki, M3
  • 7
    • 0029673273 scopus 로고    scopus 로고
    • Removal of iodine and methyl iodide in gas by wetted-wall reactor based on selective electron attachment
    • Sano N, Nagamoto T, Tamon H and Okazaki M (1996) Removal of iodine and methyl iodide in gas by wetted-wall reactor based on selective electron attachment. J Chem Eng Japan 29, 59-64.
    • (1996) J Chem Eng Japan , vol.29 , pp. 59-64
    • Sano, N1    Nagamoto, T2    Tamon, H3    Okazaki, M4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.