Quantification of metal contaminants on GaAs with time-of-flight secondary ion mass spectrometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1002-1006

  Schroder Oeynhausen F ^a   Burkhardt, B ^a   Fladung, T ^a   Kotter F ^a   Schnieders, A ^a   Wiedmann, L ^a   Benninghoven, A ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001693427     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590058     Document Type: Article

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