Applications of ICP-MS in semiconductor industry

Fresenius' Journal of Analytical Chemistry

Volumn 364, Issue 5, 1999, Pages 385-390

  Horn, M ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001631136     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160051355     Document Type: Review

References (8)

1. Jastrzebski J (1989) Materials Science and Engineering 84: 113-121
2. Bergholz W, Zoth G, Wendt H, Sauter S, Asam G (1987) Siemens Forschungs- und Entwicklungsberichte Bd. 16: 241-246
3. Ortner HM, Xu HH, Dahmen J, Englert K, Opfermann H, Görtz W (1996) Fresenius J Anal Chem 355: 657-664
4. Kawanabe I, Murase G, Yonezawa T, Maeno M, Miki N, Ohmi T (1993) Proc Advanced Wet Chemical Processing IV: 302-318
5. Volosin MT (1992) Spectroscopy 7(4): 44-47
6. Horn M, Heumann KG (1994) Fresenius J Anal Chem 350: 286-292
7. Fabry L, Pahlke S, Kotz L, Tölg G (1994) Fresenius J Anal Chem 349: 260-271
8. Streckfuß N, Frey L, Zielonka G, Kroninger F, Ryzlewicz C, Ryssel H (1992) Fresenius J Anal Chem 343: 765-768