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Volumn 80, Issue 3, 1996, Pages 1857-1866

Comparative study on dry oxidation of heteroepitaxial Si1-xGex and Si1-x-yGexCy on Si(100)+

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001609583     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362998     Document Type: Article
Times cited : (21)

References (30)
  • 15
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    • US Patent No. 4, 800, 100 (1989)
    • N. Herbots and O. C. Hellman, US Patent No. 4, 800, 100 (1989).
    • Herbots, N.1    Hellman, O.C.2
  • 19
    • 85033828468 scopus 로고
    • Ph.D. dissertation, Arizona State University
    • P. Ye, Ph.D. dissertation, Arizona State University, 1995.
    • (1995)
    • Ye, P.1
  • 21
    • 85033812659 scopus 로고    scopus 로고
    • Ph.D. dissertation, Arizona State University
    • S. Sego, Ph.D. dissertation, Arizona State University, 1996.
    • (1996)
    • Sego, S.1
  • 25
    • 85033830456 scopus 로고    scopus 로고
    • Ph.D. dissertation, Arizona State University
    • J. Xiang, Ph.D. dissertation, Arizona State University, 1996.
    • (1996)
    • Xiang, J.1
  • 26
    • 85033828752 scopus 로고
    • M. S. thesis, Arizona State University
    • S. D. Whaley, M. S. thesis, Arizona State University, 1995.
    • (1995)
    • Whaley, S.D.1
  • 27
    • 3342952286 scopus 로고
    • Physics and Chemistry of Impurity Diffusion and Oxidation of Silicon
    • edited by R. Wolfe Academic, New York
    • R. B. Fair, Physics and Chemistry of Impurity Diffusion and Oxidation of Silicon, Appl. Solid State Sci., edited by R. Wolfe (Academic, New York, 1981).
    • (1981) Appl. Solid State Sci.
    • Fair, R.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.