Ultrafast interstitial injection during transient enhanced diffusion of boron in silicon

Applied Physics Letters

Volumn 69, Issue 9, 1996, Pages 1211-1213

  Huizing, H G A ^a   Visser, C C G ^a   Cowern, N E B ^b   Stolk, P A ^b   De Kruif, R C M ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001547563     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117414     Document Type: Article

References (12)

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