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Volumn 10, Issue 7, 1998, Pages 1963-1967

Nanoscale Electroless Metal Deposition in Aligned Carbon Nanotubes

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EID: 0001539947     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980122e     Document Type: Article
Times cited : (164)

References (25)
  • 1
    • 0023211651 scopus 로고
    • See, for example: Baker, R. T. K.; Chludzinski, J. J., Jr.; Lund, C. R. F. Carbon 1987, 25, 295. Baker, R. T. K.; Chludzinski, J. J., Jr.; Dudash, N. S.; Simoens, A. J. Carbon 1983, 21, 463. Also, see the thorough review of Baker, R. T. K.; Harris, P. S. In Chemistry and Physics of Carbon, Vol. 14, Walker, P. L., Thrower, P. A., Eds.; Dekker: New York, 1978, and references therein.
    • (1987) Carbon , vol.25 , pp. 295
    • Baker, R.T.K.1    Chludzinski Jr., J.J.2    Lund, C.R.F.3
  • 2
    • 0020907823 scopus 로고
    • See, for example: Baker, R. T. K.; Chludzinski, J. J., Jr.; Lund, C. R. F. Carbon 1987, 25, 295. Baker, R. T. K.; Chludzinski, J. J., Jr.; Dudash, N. S.; Simoens, A. J. Carbon 1983, 21, 463. Also, see the thorough review of Baker, R. T. K.; Harris, P. S. In Chemistry and Physics of Carbon, Vol. 14, Walker, P. L., Thrower, P. A., Eds.; Dekker: New York, 1978, and references therein.
    • (1983) J. Carbon , vol.21 , pp. 463
    • Baker, R.T.K.1    Chludzinski Jr., J.J.2    Dudash, N.S.3    Simoens, A.4
  • 3
    • 0003701774 scopus 로고
    • Walker, P. L., Thrower, P. A., Eds.; Dekker: New York, and references therein
    • See, for example: Baker, R. T. K.; Chludzinski, J. J., Jr.; Lund, C. R. F. Carbon 1987, 25, 295. Baker, R. T. K.; Chludzinski, J. J., Jr.; Dudash, N. S.; Simoens, A. J. Carbon 1983, 21, 463. Also, see the thorough review of Baker, R. T. K.; Harris, P. S. In Chemistry and Physics of Carbon, Vol. 14, Walker, P. L., Thrower, P. A., Eds.; Dekker: New York, 1978, and references therein.
    • (1978) Chemistry and Physics of Carbon , vol.14
    • Baker, R.T.K.1    Harris, P.S.2
  • 4
    • 0342819025 scopus 로고
    • Iijima, S. Nature 1991, 354, 56.
    • (1991) Nature , vol.354 , pp. 56
    • Iijima, S.1
  • 25
    • 85034475339 scopus 로고    scopus 로고
    • note
    • For electroless nickel plating: 30 g/L of nickel chloride, 10 g/L of sodium hypophosphite, 50 g/L of sodium acetate and ammonia to pH 5. For electroless cobalt plating: 30 g/L of cobalt chloride, 4 g/L of dimethyamine-borane, 25 g/L of sodium acetate, pH 5.5.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.